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Experimental Method to Extract Effective Channel Length of Nanoscale n-MOSFETs SCIE SCOPUS

Title
Experimental Method to Extract Effective Channel Length of Nanoscale n-MOSFETs
Authors
Lee, NHChoi, HWKang, HKang, B
Date Issued
2009-11
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGI
Abstract
An experimental method of extracting the effective channel length L-eff from measured gate tunneling current (I-g) of nanoscale n-MOSFETs is proposed. The tunneling current from gate to the source and drain (I-gsd) was measured while applying a reverse bias to the substrate, and it was corrected for the depletion effect of the source/drain junctions. The gate tunneling current to the substrate (I-gc) was obtained by subtracting I-gsd from I-g. L-eff was calculated using a linear extrapolation of the I-gc versus gate length plot. The proposed method is a very simple and quite accurate method of extracting L-eff which does not require any additional assumptions and parameter extraction.
Keywords
Effective channel length; gate-source/drain overlap length; gate tunneling current; MOSFET; SHIFT
URI
https://oasis.postech.ac.kr/handle/2014.oak/27615
DOI
10.1109/LED.2009.203
ISSN
0741-3106
Article Type
Article
Citation
IEEE ELECTRON DEVICE LETTERS, vol. 30, no. 11, page. 1191 - 1193, 2009-11
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강봉구KANG, BONG KOO
Dept of Electrical Enginrg
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