Fabrication method of two-level polymeric microstructure with the help of deep X-ray lithography
SCIE
SCOPUS
- Title
- Fabrication method of two-level polymeric microstructure with the help of deep X-ray lithography
- Authors
- Lee, BK; Kwon, TH
- Date Issued
- 2008-10
- Publisher
- SPRINGER
- Abstract
- Two- or multi-level microstructures are getting more important in several applications such as multi-component micro optical elements and various microfluidic systems. In the present study, a simple and efficient method is newly proposed for a fabrication of the two-level polymeric microstructures. Making a mother two-level microstructure consists of two processes: (1) the hot embossing process for a fabrication of microstructures on a PMMA substrate, and (2) the deep X-ray lithography using the hot embossed substrate for a high aspect ratio microstructure fabrication, resulting in a high aspect ratio microstructure containing smaller microstructures on its surface. Making use of so fabricated two-level microstructures as a mother structure, one could achieve a mass replication of the same microstructures via injection molding process with a metallic mold insert obtained by a nickel electroforming onto the mother microstructure. In order to demonstrate the proposed method, a polymeric high aspect ratio microstructure having smaller square microstructures on its top surface was fabricated. The fabricated two-level microstructure shows fine vertical sidewalls, which is a characteristic feature of the deep X-ray lithography. In addition, a metallic mold insert for a mass replication was fabricated by a nickel electroforming process.
- Keywords
- REPLICATION; ARRAYS
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/28847
- DOI
- 10.1007/S00542-007-0
- ISSN
- 0946-7076
- Article Type
- Article
- Citation
- MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, vol. 14, no. 40067, page. 1739 - 1744, 2008-10
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