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Variability study of Si nanowire FETs with different junction gradients SCIE SCOPUS

Title
Variability study of Si nanowire FETs with different junction gradients
Authors
Yoon, JSKim, KRim, TBaek, CK
Date Issued
2016-01
Publisher
American Institute of Physics Inc.
Abstract
Random dopant fluctuation effects of gate-all-around Si nanowire field-effect transistors (FETs) are investigated in terms of different diameters and junction gradients. The nanowire FETs with smaller diameters or shorter junction gradients increase relative variations of the drain currents and the mismatch of the drain currents between source-drain and drain-source bias change in the saturation regime. Smaller diameters decreased current drivability critically compared to standard deviations of the drain currents, thus inducing greater relative variations of the drain currents. Shorter junction gradients form high potential barriers in the source-side lightly-doped extension regions at on-state, which determines the magnitude of the drain currents and fluctuates the drain currents greatly under thermionic-emission mechanism. On the other hand, longer junction gradients affect lateral field to fluctuate the drain currents greatly. These physical phenomena coincide with correlations of the variations between drain currents and electrical parameters such as threshold voltages and parasitic resistances. The nanowire FETs with relatively-larger diameters and longer junction gradients without degrading short channel characteristics are suggested to minimize the relative variations and the mismatch of the drain currents. (C) 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
URI
https://oasis.postech.ac.kr/handle/2014.oak/35997
DOI
10.1063/1.4941351
ISSN
2158-3226
Article Type
Article
Citation
AIP Advances, vol. 6, no. 1, 2016-01
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