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VLSI Processed InGaAs on Si MOSFETs with Thermally Stable, Self-Aligned Ni-InGaAs Contacts Achieving: Enhanced Drive Current and Pathway Towards a Unified S/D Contact Module

Title
VLSI Processed InGaAs on Si MOSFETs with Thermally Stable, Self-Aligned Ni-InGaAs Contacts Achieving: Enhanced Drive Current and Pathway Towards a Unified S/D Contact Module
Authors
백록현R.T.P.LeeR.J.W.HillW.Y.LohS.DeoraK.MatthewsC.HuffmanK.MajumdarT.MichalakC.BorstP.Y.HungC.-H.Chen염정환김태우강창용W.-E.Wang김대현C.HobbsP.D.Kirsch
Date Issued
2013-12-09
Publisher
IEEE
URI
https://oasis.postech.ac.kr/handle/2014.oak/49468
Article Type
Conference
Citation
IEEE International Electron Devices Meeting, 2013-12-09
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백록현BAEK, ROCK HYUN
Dept of Electrical Enginrg
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