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Comprehensive Study of Process-Induced Device Performance Variability and its Optimization for 14 nm Technology Node Bulk FinFETs
- Title
- Comprehensive Study of Process-Induced Device Performance Variability and its Optimization for 14 nm Technology Node Bulk FinFETs
- Date Issued
- 2012-09-05
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- IEEE SISPAD 2012, 2012-09-05
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg