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The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process
- Title
- The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process
- Date Issued
- 2008-10-20
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg