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DC and Reliability Characteristics of 45nm Node MOSFETs with using HfSiON/TiN Gate Stacks
- Title
- DC and Reliability Characteristics of 45nm Node MOSFETs with using HfSiON/TiN Gate Stacks
- Date Issued
- 2009-02-18
- Publisher
- 대한전자공학회
- Article Type
- Conference
- Citation
- 16th Korean Conference on Semiconductors (2009), 2009-02-18
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Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg