Full metadata record
DC Field | Value | Language |
dc.contributor.author | 김오현 | - |
dc.contributor.author | 이준환 | - |
dc.contributor.author | 이동헌 | - |
dc.date.accessioned | 2018-06-18T04:43:27Z | - |
dc.date.available | 2018-06-18T04:43:27Z | - |
dc.date.created | 2012-03-30 | - |
dc.date.issued | 2011-06-16 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/61254 | - |
dc.publisher | EUVL | - |
dc.relation.isPartOf | International Workshop on EUV Lithography | - |
dc.relation.isPartOf | DIGEST OF INTERNATIONAL MICROPROCESSES AND NANOTECHNOLOGY CONFERENCE | - |
dc.title | EUVL Flare Modeling with an Improved Accuracy for Feasibility Study of Sub-22nm HP Node | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.identifier.bibliographicCitation | International Workshop on EUV Lithography | - |
dc.citation.conferenceDate | 2011-06-15 | - |
dc.citation.conferencePlace | US | - |
dc.citation.title | International Workshop on EUV Lithography | - |
dc.contributor.affiliatedAuthor | 김오현 | - |
dc.description.journalClass | 1 | - |
dc.description.journalClass | 1 | - |
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