The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs
- Title
- The Influence of Source/Drain Extension Region Profile and Spacer Length on Device Performance of Tri-Gate Body-tied FinFETs
- Authors
- 김오현; 송재준; 문대현
- Date Issued
- 2009-11-18
- Publisher
- JAP
- URI
- https://oasis.postech.ac.kr/handle/2014.oak/61594
- Article Type
- Conference
- Citation
- International Microprocesses and Nanotechnology Conference, 2009-11-18
- Files in This Item:
- There are no files associated with this item.
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