Conference
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김오현 | - |
| dc.contributor.author | 이준환 | - |
| dc.date.accessioned | 2018-06-18T05:02:16Z | - |
| dc.date.available | 2018-06-18T05:02:16Z | - |
| dc.date.created | 2012-05-21 | - |
| dc.date.issued | 2009-07-15 | - |
| dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/61596 | - |
| dc.publisher | EUV Inc. | - |
| dc.relation.isPartOf | International Workshop On EUV Lithography | - |
| dc.title | An Investigation of the Impact of Mask Shadowing Effect on Flare in Extreme Ultraviolet Lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.identifier.bibliographicCitation | International Workshop On EUV Lithography | - |
| dc.citation.conferenceDate | 2009-07-15 | - |
| dc.citation.conferencePlace | US | - |
| dc.citation.title | International Workshop On EUV Lithography | - |
| dc.contributor.affiliatedAuthor | 김오현 | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalClass | 1 | - |
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Related Researcher
- 김오현KIM, OHYUN
- Dept of Electrical Enginrg