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Silicidation for Forming Low Contact Resistance of Ohmic Contact on 4H-SiC using Ni and Ti/Ni Layer

Title
Silicidation for Forming Low Contact Resistance of Ohmic Contact on 4H-SiC using Ni and Ti/Ni Layer
Authors
이정수
Date Issued
2013-07-12
Publisher
5th International Symposium on IT convergence Engineering
URI
https://oasis.postech.ac.kr/handle/2014.oak/65666
Article Type
Conference
Citation
5th International Symposium on IT convergence Engineering, 2013-07-12
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이정수LEE, JEONG SOO
Dept of Electrical Enginrg
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