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Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs
- Title
- Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs
- Authors
- 정윤하
- Date Issued
- 2007-09-18
- Publisher
- IEEE
- Article Type
- Conference
- Citation
- 2007 International Conference on Solid State Devices and Materials (SSDM 2007), page. 718 - 719, 2007-09-18
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Related Researcher
- 정윤하JEONG, YOON HA
- Dept of Electrical Enginrg