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Atomic Layer Chemical Vapor Deposition of Metal (Hafnium, Titanium) Silicate Film using a New Combination of Precursors; Hf(N(C2H5)2)4, (Ti(N(C2H5)2)4 and Si(OnBu)4
- Title
- Atomic Layer Chemical Vapor Deposition of Metal (Hafnium, Titanium) Silicate Film using a New Combination of Precursors; Hf(N(C2H5)2)4, (Ti(N(C2H5)2)4 and Si(OnBu)4
- Authors
- 용기중
- Date Issued
- 2006-07-25
- Article Type
- Conference
- Citation
- 6th International Conference on Atomic Layer Deposition, page. 124, 2006-07-25
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Related Researcher
- 용기중YONG, KIJUNG
- Dept. of Chemical Enginrg