Full metadata record
DC Field | Value | Language |
dc.contributor.author | 용기중 | - |
dc.date.accessioned | 2018-06-21T03:27:37Z | - |
dc.date.available | 2018-06-21T03:27:37Z | - |
dc.date.created | 2009-03-27 | - |
dc.date.issued | 2005-04-22 | - |
dc.identifier.uri | https://oasis.postech.ac.kr/handle/2014.oak/73238 | - |
dc.publisher | 화학공학회 | - |
dc.relation.isPartOf | 한국화학공학회 2005년 봄 학술대회 | - |
dc.relation.isPartOf | 한국화학공학회 2005 봄 학술대회 | - |
dc.title | Interfacial properties of ultra thin HfSiO2 films grown by ALCVD using Hf(N(C2H5)2)4 and Si(OC4H9)4 for CMOS application | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.identifier.bibliographicCitation | 한국화학공학회 2005년 봄 학술대회 | - |
dc.citation.title | 한국화학공학회 2005년 봄 학술대회 | - |
dc.contributor.affiliatedAuthor | 용기중 | - |
dc.description.journalClass | 2 | - |
dc.description.journalClass | 2 | - |
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