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Copper Dots Deposition Using New Precursors [Cu(I)(hfac)]2(DVTMSO) and [Cu(I)(hfac)]2(HD)
- Title
- Copper Dots Deposition Using New Precursors [Cu(I)(hfac)]2(DVTMSO) and [Cu(I)(hfac)]2(HD)
- Authors
- 이시우
- Date Issued
- 2003-01-01
- Publisher
- The Electrochem. Soc
- Article Type
- Conference
- Citation
- Proc. of the 203rd Int. Conf. on CVD and EUROCVD, page. 1305, 2003-01-01
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