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Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films using HfCl4 and Si(n-OC4H9)4
- Title
- Atomic layer chemical vapor deposition (ALCVD) of hafnium silicate films using HfCl4 and Si(n-OC4H9)4
- Authors
- 이시우
- Publisher
- American Vacuum Society
- Article Type
- Conference
- Citation
- Atomic Layer Deposition (ALD 2003)
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