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Inorganic polymer photoresist for direct ceramic patterning by photolithography SCIE SCOPUS
- Title
- Inorganic polymer photoresist for direct ceramic patterning by photolithography
- Date Issued
- 2007-08
- Publisher
- ROYAL SOC CHEMISTRY
- Abstract
- A novel negative, inorganic polymer photoresist was demonstrated to be suitable for simple and direct fabrication of tribological SiCN-based ceramic microstructures via UV photolithography and subsequent pyrolysis at 800 degrees C.
- ISSN
- 1359-7345
- Article Type
- Article
- Citation
- CHEMICAL COMMUNICATIONS, no. 39, page. 4021 - 4023, 2007-08
- Files in This Item:
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Related Researcher
- 김동표KIM, DONG PYO
- Dept. of Chemical Enginrg