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Impact of Dipole-induced Dielectric Relaxation on High-frequency Performance in La-incorporated HfSiON/Metal Gate nMOSFET

Title
Impact of Dipole-induced Dielectric Relaxation on High-frequency Performance in La-incorporated HfSiON/Metal Gate nMOSFET
Authors
백록현최길복사공현철이경택박민상최현식송승현박찬훈이상현이정수강창용H.-H.TsengR.Jammy정윤하
Date Issued
2009-12-07
Publisher
IEEE
URI
https://oasis.postech.ac.kr/handle/2014.oak/49485
Article Type
Conference
Citation
IEEE International Electron Devices Meeting, 2009-12-07
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백록현BAEK, ROCK HYUN
Dept of Electrical Enginrg
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