Conference
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
PBTI and HCI stress-induces trap generation in SiO2/HfO2 gate stack NMOSFETs and its impact on low frequency noise
- Title
- PBTI and HCI stress-induces trap generation in SiO2/HfO2 gate stack NMOSFETs and its impact on low frequency noise
- Authors
- 백록현; 이경택; 강창용; 최현식; 홍승호; 최길복; 김재철; 송승현; 박민상; 사공현철; 사공성환; 이병훈; G. Bersuker; H. H. Tseng; R. Jammy; 정윤하
- Date Issued
- 2008-09-29
- Publisher
- IEEE Device Society
- Article Type
- Conference
- Citation
- ISAGST 2008, 2008-09-29
- Files in This Item:
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
Communities & Collection
Related Researcher
- 백록현BAEK, ROCK HYUN
- Dept of Electrical Enginrg