Open Access System for Information Sharing

OASIS Repository@POSTECHLIBRARY

Browsing by Author정성우

전체 가 나 다 라 마 바 사 아 자 차 카 타 파 하

All 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

or enter first few letters:

Sort by:
In order:
Results/Page
Authors/Record:

Showing results 1 to 19 of 19

Conference

A Novel Series-resistance Extraction Method for Nano-scaled nMOSFETs Considering Mobility Degradation due to Vbs

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

Conference

Comparison of PECVD and RTCVD CESL Nitride Stressor in Reliability and Performance Improvement for High-k/Metal Gate CMOSFETs

Solid State Devices and Materials (SSDM2008), 2008-09-23

Conference

Cryogenic RF Characteristics of HfO2-Gated nMOSFET

ISAGST 2008, 2008-09-29

Conference

Effective Mobility Extraction Methodology Using RF Modeling Scheme for Leaky MOSFET with Short Channel Length and Small Area

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

Conference

Effects of High Pressure Hydrogen Anneal Process on Performance and Reliability in HfO2/SiO2 Dielectric with Contact Etch Stop Layer Stressor

IEEE Nanotechnology Materials and Devices Conference (NMDC2009), 2009-06-02

Thesis

GaAs 양자점에서의 전하측정에 관한 연구

Thesis(Doctor), 2007

정성우

Conference

Gate-Induced Drain Leakage (GIDL) Performance of Strain Engineering using CESL Stressor with High-k gate dielectric

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

Conference

High Pressure Hydrogen Annealing Effect of CESL Nitride Stressor MOSFETs with Metal Gate/High-k Dielectric on the Performance and Reliability

IEEE Nanotechnology Materials and Devices Conference (NMDC2009), 2009-06-02

Conference

New multi frequency capacitance extraction methodology for leaky MOS capacitor with High-K dielectric and metal gate

ISAGST 2008, 2008-09-29

Conference

Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

Conference

Reliability of HfO2/SiO2 Dielectric with Strain Engineering using CESL Stressor

IEEE IRPS(2009), 2009-04-26

Conference

RF and Hot Carrier Effects in metal gate/high-k Dielectric nMOSFETs at cryogenic temperature

IEEE IRPS(2009), 2009-04-26

Conference

RF characteristics for 70 nm MOSFETs below 77K

AWAD 2007, 2007-06-25

Conference

RF characteristics in Metal Gate/High-K Dielectric nMOSFETs at cryogenic temperature

16th Korean Conference on Semiconductors (2009), 2009-02-18

Conference

RF degradation of short channel metal gate/high-k dielectric nMOSFET by hot carrier effect

대한전자공학회 하계학술대회 2009, 2009-07-08

Conference

RF performance degradation in 100-nm metal gate/high-k dielectric nMOSFET by hot carrier effects

ESSDERC 2009, 2009-09-14

Conference

Series Resistance Behavior Extracted from Silicon Nanowire Transistors Using the Y-function Technique

Solid State Devices and Materials (SSDM2009), page. 1108 - 1109, 2009-10-06

Conference

Temperature dependent performances of nMOSFET with HfLaSiO gate dielectric

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

Conference

The Performance of HfSiON/TiN Gate Stack MOSFETs for 45 nm Node LSTP Application Using Conventional Fabrication Process

IEEE Nanotechnology Materials and Devices Conference (NMDC2008), 2008-10-20

OAK

개인정보처리방침 Personal Information Protection Policy

library@postech.ac.kr Tel: 054-279-2548

Open Access System for Information Sharing

Browsing by Author정성우

Browse