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Showing results 161 to 180 of 188
Conference
The applications of atomic layer deposition to nanodevices and nanotechnology

The 9th Korea-China Workshop on Advanced Materials, 2005-10-01

Conference
The atomic layer deposition of oxides and metals for next generation semiconductor devices

ISTC 2008, 2008-03-16

Conference
The benefits of PE-ALD for applications in nanoscale semiconductor device fabrication

The 5th International Conference on Advanced Materials and Devices, 2007-12-12

Article
The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfOxNy prepared by in situ nitridationSCIESCOPUS

JOURNAL OF APPLIED PHYSICS, vol. 104, no. 6, 2008-09-15

Conference
The electrical and structural analysis of Al doped ZnO deposited at low temperature using a MOCVD system

ICMAT 2009

Conference
The electrical and structural analysis of ZnO deposited at low temperature using a MOCVD system

E-MRS 2009 Spring Meeting

Conference
The Electrical Properties of Ru/Ta2O5/Si Prepared by Atomic Layer Deposition for Device Fabrication

3rd International Symposium on Advanced Gate Stack Technology (ISAGST) 27-29, 2006-09-01

Conference
The fabrication of highly sensitive ZnO nanowire gas sensor through step edge decoratio

The korean Physical Society, 2008-04-01

Conference
The Growth and Properties of PE-ALD Ta and TaN thin Films

American Vacuum Society, 2002-08-01

Conference
The Growth of Tantalum Thin Films by Plasma-Enhanced Atomic Layer Deposition and Diffusion Barrier Properties

Mat. Res. Soc., 2002-04-01

Conference
The Improvements in the Reliability of High k Dielectrics by Atomic Scale Nitrogen Depth Profile Control during Atomic Layer Deposition

The International Conference of Korean Ceramic Society for 50th Anniversary, 2007-11-01

Conference
The PE-ALD of Ta Based Metals/Nitrides: The Growth, Materials Properties, and Applications to Future Device Fabrication

American Vacuum Society, 2002-12-01

Conference
The PE-ALD of Ta Based Metals/Nitrides: The Growth, Materials Properties, and Applications to Future Device Fabrication

American Vacuum Society, 2002-11-01

Conference
The plasma-enhanced atomic layer deposition HfO2 and HfOxNy films on Si substrates with various crystal orientations

The Korean Ceramic Society, 2007-04-01

Conference
The study of p-i-n thin film solar cell as electrical and optical properties of transparent conductive oxide

E-MRS 2009 Spring Meeting

Article
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrodeSCIESCOPUS

MICROELECTRONIC ENGINEERING, vol. 85, no. 1, page. 39 - 44, 2008-01

Article
Thermal and plasma-enhanced ALD of Ta and Ti oxide thin films from alkylamide precursorsSCIESCOPUS

ELECTROCHEMICAL AND SOLID STATE LETTERS, vol. 9, no. 6, page. G191 - G194, 2006-01

Conference
Thermally robust dual-work function ALD-MNx MOSFETs using conventional CMOS process flow

VLSI Tech. Digest, page. 167 - 168, 2004-07-01

Article
Thin film growth and magnetic anisotropy of epitaxial Sr0.775Y0.225CoO3-deltaSCIESCOPUS

JOURNAL OF CRYSTAL GROWTH, vol. 310, no. 15, page. 3649 - 3652, 2008-07-15

Conference
Ultra-High Doping during Si(001) Gas-Source Molecular-Beam Epitaxy: Growth Kinetics, B-Incorporation, Strain, and Electrical Activation

American Vacuum Society, 1997-10-01

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